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Dr. Tomohiro Okumura
Panasonic Corporation, Japan
Elongated Inductively Coupled Plasma Torch for Annealing Processes
ICP was first utilized as a thermal plasma in the 1960s, long before it began being used as a high density plasma source for dry etching in semiconductor processing. Since then, ICP torches have been used in the field of spray coating and spectroscopic analysis. The basic structure of a conventional ICP torch consists of a cylindrical chamber with a heat-resistant insulator, such as quartz or ceramic, and a solenoid coil around it. Recently developed has been rapid thermal processing (RTP) system using ICP. An elongated ICP torch with a racetrack chamber enables the direct irradiation of a line-shaped elongated thermal plasma on the substrate. The annealing performance has been improved by using a ceramic chamber that ensures better mechanical and thermal properties than a quartz chamber, realizing a substrate temperature higher than 1,600 K. Attempts have been made to apply instantaneous thermal processes, such as laser annealing (LA) and flash lamp annealing (FLA), to the crystallization of amorphous silicon (a-Si) thin films, the activation of doped impurity atoms in ultra-shallow junctions (USJs) or the recovery of plasma-induced damage (PID) physically created by ion bombardment. ICP torch can be an alternative technology to realize those processes as well as reducing machine costs. In the presentation, the elongated ICP torch and experimental investigations for several kinds of applications will be discussed.
Tomohiro Okumura, male, plasma electronics engineer, received the bachelor’s and master’s degrees in electrical engineering from Kyoto University in 1989 and 1991, respectively. He joined Matsushita Electric Industrial Co., Ltd. (Panasonic) in 1991 and has worked for the same company since then. He has been working in research and development section for manufacturing process in the company, particularly focusing on plasma processing technology such as plasma chemical vapor deposition, inductively coupled plasma and very high frequency excited plasma sources and their application to dry etching and plasma doping. His recent activity is related to an elongated inductively coupled plasma torch and its application to thermal processes. He earned the Ph.D. in engineering from Nagoya University in 2007. He is the first author of sevenpeer reviewed articles and has given 12 invited talks at international and domestic conferences.He has also made chapter contributions to four books. He has been a committee member of four different international conferences and is now the chair of the program committee of 37th International Symposium on Dry Process. He is also a member of a research institution of the Japanese government.He holds 173 registered patents with the Japan Patent Office, 84 with the US Patent and Trademark Office and 39 with the China Patent and Trademark Office as of January 19, 2015.
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